Used ESTEK / ADE AWIS #9037134 for sale

ESTEK / ADE AWIS is a comprehensive automated wafer and mask inspection equipment designed to maximize the production efficiency and accuracy of wafer and mask manufacturers. The system provides an efficient, cost-effective solution for the full range of automated inspection and defect analysis. ADE AWIS is a precision instrument unit, incorporating powerful optical and imaging capabilities and advanced process controls. It utilizes an 8" wafer stage for wafer diameter up to 8", and a mask stage for masks up to 254mm X 355mm. The optics include microscope digital zoom capabilities and various types of lighting, including UV, backlight, optical filters, and specialized dark-field and dark-edge technology. The inspection machine uses advanced imaging and comparing techniques to identify and classify defects on a single image or multiple images of bare or masked silicon wafers. The software used allows a fully automated defect review process, including real-time monitoring, with the ability to store up to 8 images per defect. The tool features a high degree of customization, allowing tailored programs to be designed to address specific customer needs. The asset can analyze wafer structure and mask film down to a 0.3 - 0.4 micron size. Typical defects that can be inspected include chipping, scratches, foreign material, rubber particles, spiking defects, particle clusters, and resist residue. The model also includes a Boson integrated laser in order to detect and measure the spacing of resist patterns. The equipment is equipped with basic image diagnostics, such as contrast control, auto-focus, brightness control, color inversion, and a range of color calibration functions. It also has an automatic histogram generator to classify the defects and a comprehensive defect classification table for a better evaluation of defect data. Overall, ESTEK AWIS is a sophisticated digital wafer and mask inspection system that offers unparalleled inspection capabilities, accuracy, and speed. Its powerful capabilities and ease of use makes it an essential tool for wafer and mask manufacturers who need to reduce defects and maximize yield.