Used ESTEK / KODAK WIS-850 II #168347 for sale

ESTEK / KODAK WIS-850 II is a full-frame mask and wafer inspection equipment for manufacturing process control. It provides fast, reliable inspection of photomasks and wafers for both quantitative and qualitative analysis. It can detect a wide range of defects, from production process related defects to mask / wafer fabrication defects, including: particles of particles, pinholes, grains, and carbon residue. ESTEK WIS-850 II inspection system combines high-resolution Optical Long Working Distance Microscopes (OLWDMs) and advanced image processing algorithms. The image acquisition unit captures wafers and masks in full field of view at an image resolution of 3.5um/pixel. Through a GUI-based operation, the user can easily set up automatic mask/wafer inspection runs, configure operating parameters, and review results. The measurements of topography, CD and defect size and shape can be performed with the real-time analysis module, which searches for and classifies all wafer and mask defects within predefined acceptance rules. The machine offers both static and dynamic alignment options. In static alignment, set points are screened to reduce the search time and improve alignment accuracy. In dynamic alignment, the inspection tool uses pattern recognition and matching algorithms to automatically align masks and wafers in real-time. KODAK WIS-850 II is also designed with special software for high-contrast optical inspection that provides a fully automated inspection approach for large-scale production and batch-process control. In addition, the asset has self-calibration and auto-focus functions to adjust for machine aging, and can detect and measure distortions in patterns and units produced during the image acquisition process. Its advanced motion and lighting control capabilities ensure that all defect information is accurately collected in both bright field and dark field inspection. WIS-850 II model offers reliable performance and high through-put rate. It is easy to use, with intuitive tools and controls that allow the user to quickly set up a production run and optimize the inspection process. With its high resolution image and automatic defect inspection capabilities, it is an ideal choice for photomask and wafer production process control.