Used ESTEK WIS-900 #293595286 for sale

ESTEK WIS-900 is an advanced mask and wafer inspection equipment designed to provide superior accuracy and repeatability while inspecting advanced technology memory and logic wafers at the highest speeds. Its integrated software allows users to quickly and accurately detect and identify potential defects in wafers and masks with high accuracy rates for high-yield results. The system consists of two components: a computer-controlled scanning unit to detect any irregularities or defects in the semiconductor wafers and masks, and a comprehensive data acquisition and display machine for powerful and accurate defect variability displays. WIS-900 uses an advanced vision tool for improved inspection speed and accuracy. Its software includes an array of special algorithms for extracting varied defect parameters, creating and displaying measurement results, and generating reports. The scanning asset utilizes a moving stage and scan camera with 4-μm resolution to detect irregularities on the substrate, with up to three different materials inspected simultaneously. An introduction of advanced image processing techniques significantly improves the model's capability in detecting defects down to a defect size of 0.5-μm. The scan rate is up to 200 wafers per hour with up to 8,000 measurements per wafer. The scan field size is user-selectable and adjustable, thus allowing full-wafer defect inspection. All measurement results, as well as the defect images, can be saved and displayed on ESTEK WIS-900. The equipment provides users with thorough defect analysis and reporting, such as defect size, location, and type. Statistical, process information can be captured and displayed with fail and sort data, as well as yield results, displayed with point, surf, line and area graphs. The versatile control, data collection, and display of WIS-900 enable process and quality engineers to define and display information to their interests and requirements. ESTEK WIS-900 is a highly effective and robust way to identify and classify small defects on semiconductor devices. In addition to improved defect detection, the system improves error proofing, surveillance, and yield. It is both user-friendly and offers top-quality defect analysis. The robustness of the unit offers peace of mind and long-term reliability for all types of mask and wafer inspection.