Used FAMECS FRNB-750SA-8E-SV #9259382 for sale

FAMECS FRNB-750SA-8E-SV is a mask and wafer inspection equipment designed to provide efficient and accurate evaluation of semiconductor application. The system is designed to be versatile with features such as a high resolution camera, auto focus and frame merging, and a multi-position light source. The unit is capable of acquiring high accuracy images of both masks and wafers with its high resolution CCD camera and light source combination. The CCD camera is capable of capturing 4,000x magnification images of mask and wafer patterns, with a resolution up to 10µ (micrometers). The CCD camera combines with a specialized lens with auto focus and frame merging capabilities for imaging difficult geometry such as CDs (critical dimension substrates). The machine is also designed with a multi-position light source, to facilitate image acquisition from different angles. This is especially useful in revealing difficult-to-capture features on the masks and wafers, such as angled bevels or deep-etched patterns. The benefit of this multi-position light source is a greater completeness and accuracy in captured images, due to a variety of viewing angles inspected. In addition to this, mask and wafer inspection becomes more efficient due to the ability to quickly review from various angles captured in one frame. The tool is designed to be user friendly with an intuitive image feedback panel. It incorporates a variety of images and trend-based feedback and statistics, such as min/max intensity, total number of pixels, etc. This panel allows users to review, inspect, and validate the images obtained from the CCD camera. The asset also has the capability of performing defect analysis of circuit patterns with its measurement and judgement functions. Users can quickly judge and validate the quality of the circuit patterns by calculating min/max size of each pattern, percentage of area size of each pattern, or other statistical features. FRNB-750SA-8E-SV Mask and Wafer Inspection Model is designed to provide users with a powerful and efficient equipment that captures quality images of both masks and wafers with its high resolution CCD camera and multi-position light source combination. Its intuitive image feedback panel and defect analysis functions make performing inspection and validation a fast and efficient process. It is a great solution for users who need to accurately and quickly evaluate their semiconductor applications.