Used HENNECKE He-WI-03 #9071444 for sale

HENNECKE He-WI-03 is a Mask & Wafer Inspection equipment for optical pattern measurement applications. Its high-resolution imaging sensor produces excellent image quality, allowing researchers and engineers to accurately inspect mask images and evaluate defect positioning. The system features a compact design with a single microscope, adapted CCD camera unit, and a positioning machine. The microscope captures high-resolution images with up to a 64x magnification range and can be adjusted to focus on wafers from 0.5 mm to 3.5 mm in size. This precise zoom and focus range makes it ideal for capturing detailed images of wafer patterns at a high level of accuracy. The camera tool is equipped with an advanced charge coupled device (CCD) and can capture images at up to 5 megapixels with twelve-bit enhanced color depth. It also features an advanced image processing asset, enabling users to examine images for specific defects and accurately determine defect positioning. The model's positioning equipment not only allows for precise wafer image capturing, but also supports the automated placement of the mask images in the microscope. This ensures that the images placed in the microscope are properly aligned with the mask, eliminating user error and simplifying the measurements. He-WI-03 is also integrated with special software that allows users to compare customer mask images to internally generated masks and defect images. Additionally, the software enables users to visualize defect location and distribution in the image, increasing the accuracy of the inspection process. The system provides accurate and reliable data, and is suitable for both in-line and off-line use. With its enhanced image performance and user-friendly software, HENNECKE He-WI-03 makes it easy to identify and analyze wafer defects.