Used HERMES MICROVISION / HMI eP3 XP #9293877 for sale

HERMES MICROVISION / HMI eP3 XP is a mask and wafer inspection equipment that provides a high level of accuracy and precision for identifying microscopic defects and features in complex, high-density pattern designs. The system uses a combination of advanced image processing and innovative algorithms to rapidly and thoroughly inspect both sides of the mask or wafer. HMI eP3 XP includes powerful laser scanning technology to gather high-resolution stereo data quickly and accurately. The unit uses a 2-camera, contactless imaging machine to provide full-field stereo images of the mask or wafer. Its proprietary pattern recognition software supports automated defect inspection and 3D profile feature detection. The proprietary vision platform employed by HERMES MICROVISION eP3 XP uses a sophisticated three-dimensional (3D) analytical imaging tool to rapidly identify and isolate even the smallest defects or features. The asset is designed to bring defect detection and wide-field imaging down to nanometer accuracy. The model also incorporates many features that make it intuitive and user-friendly, including an easy to use graphical user interface (GUI). This allows users to access various tools quickly and efficiently. The equipment also provides multi-layering capabilities, which allow operators to configure inspections for individual feature types. HMI eP2 XP is a robust system that is suitable for use in a variety of applications, such as inspection and defect detection of advanced fabrication masks and dies, and integrated circuit (IC) wafers. It has many features that make it an excellent choice for any mask and wafer inspection application, such as its proven defect detection and 3D surface profiling capabilities. Overall, eP3 XP mask and wafer inspection unit is an advanced, user-friendly machine that provides the ultimate capability for inspecting masks and wafers for defects and features. By leveraging the latest technologies, the tool is able to quickly and accurately detect microscopic defects and features, helping ensure the highest level of product and process quality. The intuitive GUI and multi-layering capabilities further enhance the asset's usability and utility, making it an excellent choice for any mask and wafer inspection application.