Used HERMES MICROVISION / HMI eP3 XP #9309099 for sale

HERMES MICROVISION / HMI eP3 XP
ID: 9309099
Wafer Size: 12"
E-Beam inspection system, 12".
HERMES MICROVISION / HMI eP3 XP is a high-precision mask and wafer inspection equipment designed to provide a comprehensive and cost-effective solution for advanced process control and yield optimization in semiconductor micro- and nanoelectronics manufacturing. It offers the ability to detect defects both in single-layer and multi-layer masks, as well as on both standard and high-efficiency wafers. HMI eP3 XP features a collection of small fields of view (FOVs) that cover the entire sample. This ensures that the field of view for mask and wafer inspection is appropriate for all stages of the fabrication process. This system is equipped with two integrated CCD cameras - one for non-visible-light illumination and one for visible light illumination to give full optical coverage of the entire sample. It also features an image pre-processing engine to filter out background noise and reduce shadowing effects, as well as pattern recognition software to detect the finest defects down to the sub-micron level. The unit is designed to work with a variety of substrates, including Silicon, sapphire, quartz, and polysilicon. It inspects a range of surfaces with automated precision, including flat, curved, and 3D. HERMES MICROVISION eP3 XP enables quick and precise inspection of masks, wafers, and substrates with minimal manual intervention. It delivers reliable and consistent results, and its advanced optical and image processing algorithms safeguard maximum process yields, reducing costly errors and scrap. The machine also includes easy-to-use software designed for automated data analysis and reporting. EP3 XP can be integrated with enterprise software systems and data servers to facilitate efficient transfer of inspection results. It includes advanced functions such as site mapping, sample a map, and pattern tracking, and supports a variety of languages. HERMES MICROVISION / HMI eP3 XP is a highly reliable and efficient mask and wafer inspection tool with minimal footprint. It can handle large sample sizes and complex layouts with consistent accuracy and precision, while its intuitive controls make it easy to operate. Its features and performance make it a suitable choice for semiconductor manufacturers seeking advanced quality assurance and process optimization.
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