Used HERMES MICROVISION / HMI eP4 #9281324 for sale

HERMES MICROVISION / HMI eP4 is a versatile tool for mask and wafer inspection. It employs advanced image processing technology based on 4K resolution and up to 50x magnification to quickly and accurately detect any anomalies in the design of semiconductor masks and wafers, such as particle contamination or line-width and line-spacing variations. This superior image quality is made possible by its high-performance optics equipment, which includes a long focal depth 2x4K CCD camera, dual variable-photoelectric (VPE) illumination and optional light field filters. This configuration offers outstanding contrast and sensitivity by eliminating scattered and reflected light, while also providing uniform illumination over the entire field of view. HMI eP4 also has an intuitive user interface with an interactive touchscreen and visual instruction system for easy operation and rapid fault detection. The unit is built with a modular design for enhanced functionality and efficiency, with the ability to easily add optional lateral scanning and particle/defect detection capabilities. HERMES MICROVISION eP4 is capable of scanning the entire surface of a wafer or mask at a maximum rate of 40 wafers/hr. It supports up to 16 different scanning intensities and can be used in a wide variety of applications, such as particle, defect and crystallographic imaging. Additionally, the machine is equipped with a defect nano-analysis library to quickly identify abnormal elements and support consistent production quality. EP4 is a highly capable tool for precise and reliable mask and wafer inspection. It offers superior image quality, intuitive user interface and innovative modular design, making it the ideal solution for highly technical and demanding inspectation requirements.