Used HERMES MICROVISION / HMI eP4 #9389783 for sale

HERMES MICROVISION / HMI eP4 is a mask and wafer inspection equipment designed with state-of-the-art imaging technology for high-precision nanotech applications. This system offers a comprehensive inspection solution that is capable of detecting defects and anomalies at the micron level. The integrated features of the equipment enable efficient and rapid defect analysis of semiconductor wafers and masks, helping to achieve higher yields in production. The unit sees a wide range of applications in advanced semiconductor manufacturing and chip design including 3-D and flip-chip package inspection, micro-fluidic device inspection, mask inspection, and many more. Built with ultra-short multiple wavelength illumination and variable optics, the machine enables ultra-high contrast imaging that allows for detection of very small and difficult-to-detect defects. The optics of the tool are fitted with a decoupled objective and projection asset, a prime-focus objective, and an automated focus-follow capability, providing a wide field of view and superior image depth. With its advanced optics, the model enables high-resolution imaging and image enhancement for up to 10x magnification. Additionally, the tool is also capable of woofer/tweeter illumination technique, providing dynamic range modification and better signal to noise ratio. The user interface of the equipment is designed for easy navigation and operation. It includes an intuitive touch screen display with customizable menus to access all the features and options. A joystick mounted on the input device allows for easy manipulation of the optical view and control settings. The system is also capable of imaging specimens in both bright-field and dark-field modes, offering excellent flexibility. HMI eP4 unit is an excellent choice for semiconductor design and manufacturing. Its advanced optical design and user-friendly interface allow for fast, precise, and reliable defect analysis and mask inspection. The machine is applicable to a wide range of nanotech applications, providing the highest quality imaging and high-precision measurements.