Used HERMES MICROVISION / HMI eScan 500 #9390712 for sale

HERMES MICROVISION / HMI eScan 500
ID: 9390712
E-Beam inspection systems.
HERMES MICROVISION / HMI eScan 500 is a state-of-the-art mask & wafer inspection equipment which offers critical features for optimizing process control. The system is built around an optically controlled microscope which is equipped with industry standard HIS (High Image Sensor) technology to ensure the highest image fidelity on the market. It supports a range of optical magnifications, ranging from 5X to 100X, to provide the widest inspection field of view over a wide range of applications. HMI eScan 500 is a world-class 3D mask & wafer inspection unit that automatically detects patterns and defects at a nano-level of precision. It offers high-performance defect detection capabilities with an advanced optical imaging machine and LED illumination for superior image contrast. The tool can be fully automated to detect a variety of defects including topographic, dark marks, particle defects, bright-field, etc. It also features improved edge detection accuracy for locating patterns in more difficult material layers. Furthermore, the asset is equipped with a patented auto-calibration algorithm and built-in correction algorithms to ensure the highest level of accuracy and repeatability over long periods of time. The model's advanced software allows the mask & wafer inspection equipment to perform efficient pattern recognition across both light and dark patterns. It can detect a wide range of defects such as pits, scratches, smears, contaminate and mis classified pattern images. The software also offers powerful intelligence for reporting results and analyzing inspection data. It can process large amounts of image data quickly and accurately while reducing the need for manual inspections. HERMES MICROVISION eScan 500 also offers a range of automated inspection capabilities, such as the in-situ analysis of defects in order to measure their sizes and shapes, or do precise positioning of the defects. The system can also detect discrepancies between images in the same field or between images from different fields. Moreover, the unit offers a comprehensive library of pre-defined defect and pattern recognition algorithms for easy customization. Overall, eScan 500 is an excellent choice for demanding mask & wafer inspection process. It combines powerful optics, advanced software, LED-illumination, and comprehensive automation to deliver maximum performance in a cost effective package. This is why the machine is well-suited to a variety of mask & wafer inspection applications.
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