Used HIMS NMI-100 #9234652 for sale

HIMS NMI-100 is a mask and wafer inspection equipment with state-of-the-art optical and IT technology. The system provides an excellent view of the entire surface of masks and wafers, enabling it to detect defects at the nanometer scale. NMI-100 uses high-resolution adaptive optics with advanced defocus measurement technology and a powerful illumination illumination unit to detect very subtle defects even in dense images. The unique combination of advanced optics, image processing algorithms and precision robotics is capable of detecting and measuring particles and defects as small as 1nm. HIMS NMI-100's scanning machine can be configured with multiple wafer stages, allowing high-throughput inspection without sacrificing accuracy or precision. The tool is also equipped with a high-precision motorized stage for accurate and repeatable positioning of wafers and masks. Additionally, the asset is capable of analyzing high-density regions of chips with up to thousands of features. NMI-100 features a highly optimized batch-processing architecture which allows for maximum accuracy and throughput. The Inspection modules can scan up to 8 mask and 8 wafer simultaneously, with a support of up to 16 mask and 16 wafer batches, improving efficiency and accuracy. The model also supports two parallel inspection channels for the inspection of two different product types in one run. HIMS NMI-100 is also equipped with a powerful defect-classification equipment, which allows for the automatic separation of defects according to its type. The system is capable of segmenting particles, isolated defects, as well as fault-depositing ones, providing an accurate analysis of the defect type while reducing the false-alarm rate. NMI-100 is capable of recognizing repeatable defects and features robust image processing algorithms coupled with high-throughput inspection information. Automatic detection and rejection of false-alarm locations and mistakes enable HIMS NMI-100 to accurately detect defects, even in dense images. Additionally, the unit can recognize defect sizes as low as 1nm, allowing it to detect even very small defects. NMI-100 is a valuable tool for mask and wafer inspection, providing a comprehensive suite of technological capabilities and superior precision. The high-throughput and accurate results delivered by the machine makes it ideal for use in manufacturing and test environments.