Used HITACHI IS 2000 #9103910 for sale

HITACHI IS 2000 mask and wafer inspection equipment is an automated, high throughput mask and single wafer inspection system that combines superior design with an advanced suite of mask and wafer defect detection capabilities. The unit seeks to provide the best possible results for defect detection while minimizing user intervention. Using a high energy BSE/SE/Raman imaging technology, this machine utilizes a high-resolution 10-megapixel (11,520 x 9,024 pixels) Peltier-cooled, 50mm CCD camera to produce high-contrast images with a minimum noise level. The tool also includes advanced novel algorithms for image processing and feature recognition to improve defect detection. It has a Stage Resolution from 0.6um to 0.5 μm, a boundary-centroid Distortion <100nm and an accuracy for background and optically dielectric measurements of <1%. This asset is also capable of defect length measurement with a minimum value of 0.1μm and an accuracy of 0.08μm. In addition to its superior design and defect detection capabilities, the model is equipped with powerful software to ensure user-friendly operation. The equipment offers a range of useful features, including: automatic defect classification, focal point control, inspection pattern generation, defect prevention settings, and defect map management. The system is also able to save inspection results automatically. The software runs in Windows (7 or later) making it easy to operate. IS 2000 Mask & Wafer Inspection Unit is designed to automate the process of identifying defects, making it ideal for use in applications ranging from advanced-level process control to mask or wafer development. Its product design gives users the flexibility to inspect a wide range of masks and single wafers, delivering a powerful, cost-effective solution to mask and wafer inspection.