Used HITACHI IS 2500 #293657153 for sale

HITACHI IS 2500 is a high-end, high-accuracy mask and wafer inspection equipment that provides complete pattern verification and defect detection solutions. The system utilizes an intra-field inspection unit, allowing it to achieve nanometer-level accuracy. It is designed to perform both traditional optical inspections, as well as automatic defect detection, using advanced algorithms and machine learning techniques. The machine takes advantage of its high-end optics, combined with specialized optics, such as its aberration corrective optics, to enable it to perform pattern recognition and defects detection. Its unique combination of lenses and mirrors enable the tool to produce ultra-high resolution images over a wide range of viewing angles to identify any anomalies or imperfections in the pattern. The asset features an advanced pattern recognition algorithm that allows it to quickly identify any defects with a high degree of accuracy. By using feature comparison techniques such as marginal harmonics, high frequency discriminators, and cross correlation, it is able to effectively determine differences between target patterns and their reference patterns. It is capable of detecting both local and global defects, including electrical shorts, breaks, spacing violations, and overdraws. The model also has a highly accurate overlay error measurement equipment that ensures accuracy of the final wafer pattern. It makes use of both in-line and out-of-line inspection techniques to measure and correct both vertical and lateral overlay errors. It reduces measurement error associated with registration misalignment and mismatches between successive layers. Finally, HITACHI IS-2500's software package includes an advanced analytics interface to monitor and analyze inspection results. This includes visual overlays, defect time tracking, and comparison of multiple designs and layers for the same wafer, allowing for highly accurate detection and verification results. Overall, IS 2500's comprehensive feature set and high accuracy make it an ideal choice for anyone looking for an advanced mask and wafer inspection system. Its specialized optical components, pattern recognition algorithms, and analytics interface allow it to provide highly accurate results, ensuring that each and every defect can be identified and corrected.