Used HITACHI IS 2500 #293818803 for sale

ID: 293818803
Vintage: 1997
Wafer inspection system 1997 vintage.
HITACHI IS 2500 mask & wafer inspection equipment is an automated, high resolution imaging solution for semiconductor production line. It is designed to ensure defect detection and continuous correction of mask and wafer topography. This system uses infrared and visible light to examine precise details of wafer surface structures and defects, without damaging the wafer or compromising it's performance. The unit can detect a wide range of defects, including surface contamination such as dust and residue, as well as defects such as line breaks, residues, protruding marks and pinholes. HITACHI IS-2500 is equipped with the latest high resolution optics, providing a large field of view. This allows users to inspect both sides of the wafer at once, reducing the time and cost of inspection activities. The machine utilizes a built-in laser scanner, providing superior resolution and accuracy. Its high speed scanning ability greatly increases the information collection rate, providing detailed images quickly and efficiently. Additionally, the scanner can be upgraded to accommodate a wider range of wavelengths, allowing for improved defect detection. In addition to the laser scanning capabilities, the tool also utilizes a high precision, high speed auto-focus asset. This helps to ensure correct surface measurement and defect detection. The model also has the capability to detect minute defects that occur during the fabrication process. The equipment offers highly accurate measurement and high resolution imaging. IS 2500 is easy to install and intuitive to use. It can be networked together with other systems, allowing users to access images from multiple locations. The system also offers increased flexibility by allowing users to adjust the imaging settings for different wafer levels and fabrication processes. IS-2500 is versatile, reliable and cost effective. It offers a comprehensive solution for quality control and defect detection, allowing users to maximize the efficiency and efficacy of their production process.
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