Used HITACHI IS 2510 #293657152 for sale

HITACHI IS 2510
ID: 293657152
Wafer Size: 6"
Vintage: 2002
Wafer particle inspection system, 6" 2002 vintage.
HITACHI IS 2510 is an advanced mask and wafer inspection equipment that provides high-resolution, high-accuracy inspection of Defects on the Masks and Wafers during the production process. This high-tech system is designed for critical inspection tasks that require the highest possible level of image quality and measurement accuracy. It is the only unit in its class to support high-resolution imaging of both Mask Defects and Sub-wavelength Wafer Defects. As a result, it provides the maximum degree of fault coverage and detection capability for production wafers and Masks. The machine is based on a Chromatic Confocal Spot (CCS™) technology, which provides superior resolution and image quality for wafer inspections. This CCS technology has been proven to efficiently scan and detect Defects on both mask and wafer surfaces. The tool also incorporates advanced pattern recognition algorithms and other state-of-the-art techniques for producing exceptional image results. IS 2510 is also equipped with a robust defect database management asset that allows the user to efficiently create and manage comprehensive mask and wafer defect databases. This database can be used to quickly search for and identify Defects on both mask and wafer surfaces. The model also includes powerful, easy-to-use software for comprehensive defect analysis and reporting. HITACHI IS 2510 equipment is further enhanced by precision hardware that provides outstanding performance for both wafer and mask inspections. The system includes a micron accuracy X-Y stage for precise positioning of the mask or wafer. High-quality lenses provide excellent magnification and aberration-free imaging. And the latest imaging advance is used to provide superior imaging of both mask and wafer Defects. This advanced unit is designed to meet the demanding production requirements of the semiconductor industry. It is able to detect Defects on both Masks and Wafers, providing maximum coverage of the production process. With its robust Defect Database Management Machine and advanced imaging capabilities, IS 2510 makes it easy to detect and eliminate Defects during the production process.
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