Used HITACHI IS 2610 #9144002 for sale

HITACHI IS 2610 is a high-performance mask and wafer inspection equipment designed to provide detailed, high-resolution inspection of various types of semiconductor wafers and photomasks. The system uses advanced optical imaging technology to detect defects and imperfections in wafers and masks with nanometer resolution. In addition, the unit uses a state-of-the-art computer-aided-design (CAD) platform to automatically detect defects, analyze data, and optimize inspection processes. The machine includes a dual scanner design, a pattern recognition engine, a macro block image correction module, an automatic binning feature, and a stereo optical tool for enhanced 3D defect detection. This combination of technologies helps to ensure the most accurate results during inspection. The image sharpening process maintains high-quality images that enable detailed evaluation and reliable pattern recognition. The innovative pattern recognition engine can identify defects in photos and prioritize them for inspection and repair. This feature helps to reduce reworking times and improve production yield. The automatic binning feature enhances production accuracy, while the stereo optical asset improves 3D defect detection. IS 2610's advanced optics combine high-resolution imaging and an innovative dual-head design for improved automated defect detection. The model uses binary optics, combined with focusing and cluster/tiling algorithms, to detect defects with nanometer accuracy. The focus on depth and contrast provides improved image quality and reliable defect detection. The integrated lighting equipment ensures optimal illumination for variable samples. Furthermore, the macro block image correction module corrects and enhances the image quality of even the smallest defects and imperfections, while the stereo optical system enables 3D defect identification. HITACHI IS 2610 also provides users with a range of software tools and options for customizing inspection processes and optimizing yield. The unit includes an intuitive graphical user interface (GUI) for easy set up and analysis, asset management tools, comprehensive reporting and trend analysis, data export capabilities, and a range of optional feature(s) for further customization. This comprehensive feature set enables users to customize the inspection process to best suit their needs and to maximize production efficiency. In conclusion, IS 2610 is an advanced mask and wafer inspection machine that provides detailed, high-resolution data for reliable defect detection and improved production yield. The tool combines imaging technologies, automated defect identification tools, and software features to optimize inspection processes and ensure consistent, reliable performance.