Used HITACHI IS 2610 #9158756 for sale

HITACHI IS 2610
ID: 9158756
Wafer Size: 8"
Defect inspection system, 8".
HITACHI IS 2610 is a wide area automated mask and wafer inspection equipment designed for the inspection of photomasks during the stages of design, manufacturing, and reticle management. It is a fully automated, high precision scanning and inspection system that can be used for a variety of images and wafer types. The unit features a unique optical assembly that enables the user to quickly scan and inspect large areas of photomask and wafer samples, with resolutions of up to 12.5µm. IS 2610 is highly versatile and can be used for a number of different experiments, such as bi-dimensional pattern recognition, or to examine patterns as small as 0.5µm. The machine comes with an auto-track capability that allows the user to perform automatic pattern recognition, mask tracking, and mask registration of the sample image without manual intervention. The tool utilizes a 5-axis CCD camera and a rotating optical axis, which allows for the utmost precision in image analysis and inspection. Multiple image processing algorithms can be used to detect various defects on the surface of the sample, such as scratches, burrs, and other faults. The asset also has a unique feature that allows users to save their settings in a common configuration file which can be transferred to other units of the same type. Additionally, the model is equipped with an ergonomic and space saving design. It has an integrated working table that makes it easy to transport around, and can easily be adjusted to any size or angle to enable a precise examination. The equipment is also able to communicate with a wide range of peripheral devices, such as printers and scanners. HITACHI IS 2610's optical assembly is powered with a combination of laser and ultra-high harmonic imaging. This allows it to detect any optimally-common features (e.g. edges, corners, and patterns) on a wafer substrate quickly and accurately. The user can also select the optimal imaging conditions which are tailored to the user's specific needs. IS 2610 is an essential tool for producing high-quality wafers and masks, and is an ideal system for use in research, fabrication, and testing rooms. Its advanced capabilities enable users to quickly simulate and analyze their design quickly and accurately. HITACHI IS 2610 can be used to greatly improve productivity and reduce the production costs associated with mask production and wafer inspection.
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