Used HITACHI IS 3002 #9181637 for sale

HITACHI IS 3002 is a high-precision mask and wafer inspection equipment designed to meet the unique needs of the semiconductor fabrication industry. This system is equipped with an advanced CCD camera, a 2K colour monitor, and a top-of-the-line image processing unit, allowing for exceptional image quality and precise inspection of any type of mask or wafer. IS 3002 can be programmed to perform a range of automated tasks including alignment calibration, defect review, edge detection, and defect classification. The machine also features an intuitive user interface and a variety of inspection modes, allowing users to quickly and accurately adjust settings as necessary. Additionally, the mask and wafer inspection tool offers a wide range of functions, including particle searching, image stitching, metrology and a wide range of analytical capabilities. HITACHI IS 3002 also comes equipped with a range of other features to help improve accuracy and reduce costs. These include an advanced slide alignment asset that precisely locates targets, a powerful lens model that accurately captures objects, automated illumination control to provide optimal signal-to-noise ratio, and an artificial intelligence equipment that rapidly detects and classifies masks and wafers. IS 3002 also offers several additional features that simplify its use. These include a penta lens system that allows for the simultaneous capturing and analysis of different locations on the wafer or mask, automatic image-capturing features, a remote client-server unit that enables users to access the machine from any networked location, and a variety of reporting formats. HITACHI IS 3002 also offers a wide range of automated tool calibrations, which help to ensure the asset captures consistent and accurate images over time. The model also includes built-in safety features that protect the equipment from data corruption and incorrect operations. Lastly, the system's data transfer function allows images to be transmitted to other users within the same network. In conclusion, IS 3002 provides a comprehensive and powerful tool for detecting and analyzing mask and wafer defects. Its advanced CCD camera, image processing unit, intuitive user interface, and wide range of analytical capabilities enable users to quickly and accurately identify defects on a variety of objects. Additionally, its built-in calibrations, safety features, and data transfer capabilities make it a great choice for any semiconductor manufacturing operation.