Used HITACHI LA-3100 #293643481 for sale

HITACHI LA-3100 is a mask and wafer inspection equipment developed by HITACHI. It is a fully automated high-throughput system that is used for inspecting semiconductor wafers, masks and photomasks. The unit is capable of inspecting multiple chips simultaneously, enabling batch processing that allows higher throughput. LA-3100 is equipped with a high-precision image sensor with double and triple exposure modes, allowing high accuracy in detection and analysis. The machine is also equipped with an automatic wafer feeder (AFW) and multiple images processing systems (MIP), which enable one-and-done imaging. It is also equipped with an automatic aligner which enables imaging and alignment of all 6 sides of a wafer. The tool features a proprietary Laser-Induced Fluorescence Imaging (LIFI) method, which allows non-destructive imaging and eliminates particles from the field of view. The asset is also equipped with an automated repairing model, which supports real-time repair of defects, giving the equipment greater accuracy and more efficient repair. The system's image recognition unit utilizes both an edge extraction and a hole detection technique, allowing high precision in defect detection and analysis. Additionally, the machine's imaging software, which in combination with the MIP tool, processes high-resolution images and signal processing, such as optical filters, enabling high-speed and high-precision image analysis. The asset is also equipped with a real-time image vector analysis model, which provides high-precision detection of defects without the need of human intervention. It can also store images, giving the option of archiving results and viewing defect history. HITACHI LA-3100 is an ideal solution for inspecting semiconductor wafers, masks and photomasks. Its high-precision imaging sensor and automatic alignment, coupled with its high-speed and high-precision image analysis and automatic defect repairing, provide exceptional accuracy and reliability. The equipment's real-time image vector analysis system gives it an edge over other systems, giving it greater accuracy and efficiency in defect detection.