Used HITACHI PD 3000 #293754411 for sale

HITACHI PD-3000 is a mask and wafer inspection equipment that is able to quickly and accurately inspect masks and wafers with the goal of detecting defects, such as overlapping patterns, thinning or excessive thickness of lines, and micro roughness. The system is designed with a variable field of view for use in various applications, both for device fabrication and packaged semiconductor devices, allowing inspection areas of variable size. PD-3000 includes an image capture unit that is capable of precision light adjustment for true color images of the sample, with reference to a calibration target. It is also equipped with a 3-stage optical machine, two horizontally-displaced imagers, and an algorithm-based image processing tool for automatic calculation of imaging conditions. The alignment of the optical asset is automatically adjusted for optimal performance. HITACHI image processing model is capable of detecting features on the masks and wafers with an accuracy rate of 0.01 micron. This equipment enables the detection of defects that were not possible to detect with previous technology. The system is also able to detect changes in image brightness or contrast and automatically adjust them. The inspection unit also allows for manual dissection of images in order to detect extremely small defects. Furthermore, HITACHI PD-3000 enables the adjustment of a range of parameters such as the LED, the camera sensor, and the light source for optimal performance. This increases the accuracy of image acquisition and enables inspection of wafers and masks with high precision. The machine is also designed with no operator intervention in the image acquisition, allowing for unattended operation. The tool is designed with environmental specifications such as temperature and humidity control, in order to ensure the accuracy of image acquisition, even in harsh environmental conditions. Furthermore, the asset is equipped with a control interface for the efficient management of data, enabling multiple users to access the same data. Overall, PD-3000 is an advanced mask and wafer inspection model that is designed to detect defects with high accuracy. The equipment encompasses a range of features, such as an automated image processing system, a variable field of view, and environmental control, which ensure that the unit consistently produces accurate images and detects defects quickly and accurately.