Used HITACHI PSD10-2U #9167732 for sale

HITACHI PSD10-2U is a high-performance mask and wafer inspection system providing extremely precise scanning and inspection results. It is specifically designed to meet the stringent requirements for dielectric, optical, and electrical inspection, even for ultrafine features with minimal production downtime. PSD10-2U is equipped with a high-definition camera and advanced image processing tools, allowing the system to detect even subtle defects with extreme accuracy. It offers high-speed inspection that can reduce the amount of time required for inspecting an entire wafer. It is also capable of dynamic focusing with its unique autofocusing mechanism, which provides improved defect detection as it can ensure complete coverage of the entire mask or wafer surface. The system is equipped with a powerful scan engine that can deliver images at speeds of up to 1200 mm/s, allowing for rapid and efficient defect detection in just a few seconds. This is especially useful in high-volume production where quick identification of defects is critical. Furthermore, HITACHI PSD10-2U is capable of reliable substrate-to-substrate inspection, meaning that the same sub-micron detail can be compared over various substrates quickly and easily. The scanning area of PSD10-2U is variable depending on the application. It can handle wafers up to 16 inches in size, with resolutions up to 10-micron images. It also offers a variety of imaging techniques for inspecting various substrate materials such as amorphous silicon, ICs, MEMS, and optical discs. In addition to inspection capabilities, HITACHI PSD10-2U also offers comprehensive quantitative analysis and pattern recognition capabilities. It is equipped with refined signal-processing algorithms, such as dielectric defect identification, dark line and bright line analysis, and on-die leakage defect detection. This provides pinpoint accuracy in detecting subtle defect patterns and identifying any underlying causes, while simultaneously supplying detailed qualitative and quantitative measurement data. Overall, PSD10-2U provides state-of-the-art mask and wafer inspection, allowing manufacturers to quickly identify and address any defects quickly and accurately. Its blend of speedy scanning, comprehensive analysis, and robust defect detection capabilities make it an excellent choice for those seeking reliable, high-performance mask and wafer inspection.