Used HITS HXATL-1000 #293670426 for sale

HITS HXATL-1000 is a cutting-edge mask and wafer inspection equipment designed for a variety of industrial inspection applications. Intended for automated industrial inspection, this system utilizes advanced image analysis and processing algorithms to detect material defects, foreign particles, contamination, and other defects in hard masks and wafers. HXATL-1000 is capable of a variety of imaging modes, including Variable Spot Size, Fixed Spot Size, and Dual Beam, each of which can be combined with the unit's EDS real-time particle inspection feature. In Variable Spot Size mode, users can count and measure the total number of particles. Fixed Spot Size mode focuses on a smaller area with a higher resolution, allowing for a more detailed analysis of particles, while Dual Beam mode is used to detect differences in thickness in the mask or wafer. Each imaging mode is equipped with unique performance and process requirements that ensure accuracy. HITS HXATL-1000 is highly automated and easy to use, featuring a continuous imaging machine that allows for quick scanning speeds and high accuracy. The tool is equipped with intuitive software tools that enable users to create customized image analysis and processing processes in order to better identify material defects, contaminants, and other problems. Furthermore, the asset features a user-friendly graphical user interface which allows for easy navigation and operation. To ensure consistently accurate inspection results, HXATL-1000 incorporates advanced imaging and particle identification technology. This feature utilizes dynamic time thresholding to detect particles quickly and accurately. Additionally, the model's image analysis and comparison technologies allow users to quickly compare and contrast images of masks and wafers in order to identify defects and other errors. Altogether, HITS HXATL-1000 is a cutting-edge mask and wafer inspection equipment that is designed to quickly and accurately detect material defects, contaminants, and other contamination issues. Its advanced imaging capabilities, intuitive software tools, and user-friendly graphical user interface make it an ideal choice for mask and wafer inspection applications.