Used HORIBA PR-PD2 #293751087 for sale

HORIBA PR-PD2
ID: 293751087
Wafer Size: 8"
Reticle / Mask particle detection system, 8".
HORIBA PR-PD2 is a high-performance mask and wafer inspection equipment designed to increase throughput, accuracy and traceability. It offers superior image quality and defect detection capabilities, combined with an intuitive user interface. The system features a newly developed scanning electron beam (SEM) technology that is capable of scanning wafers from light to dark with a uniformity of ±3%. With a 3.2 GHz scan speed, it is able to scan up to 1000 wafers/hour, improving throughput with reduced inspection time. For automated defect analysis, the unit uses advanced algorithms that recognize defects accurately and identify any issues. It features an automated chip recognition using X-ray which allows it to detect contaminations on the back of the wafers, as well as process yield analysis. A 'Pattern Sense Window Comparison' feature allows the machine to analyze data from similar patterns, for example, the same size and orientation at different locations. This allows for better performance in the field. The tool is equipped with a 3D-profiling capability that guides the scatterometry analysis to identify surface irregularities and other defects. An automated reflectivity mode for oxides and nitrides supports the evaluation of complex thin film layers. The comprehensive software package offers all features required to complete a range of tasks with ease, such as defect classifying, sorting, inspection management and data mining. The software is specially designed to provide comprehensive analysis of 4-bit data structures, enabling comparison of images from different sources. With its unique features, HORIBA PR-PD 2 provides manufacturers with the capabilities needed to inspect device masks and to detect defects in a variety of applications. It is an ideal tool for automated wafer inspection, helping manufacturers maximize efficiency and reduce cost.
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