Used HORIBA PR-PD2 #293778203 for sale

HORIBA PR-PD2 is a highly advanced mask and wafer inspection system designed to provide high-accuracy and high-speed analysis of critical defects in advanced masks and wafers. The system consists of a Dual Light Source High Speed Inspection Unit, which is equipped with two independent light sources, an 8X objective and a wide field of view. Additionally, the system uses an advanced CMOS sensor, enabling high-speed, high-resolution image capture. This is further complemented by HORIBA Image Analysis Toolbox (HIAT) software, which allows for the detection, identification, and quantification of defects on masks and wafers being tested. The Dual Light Source High Speed Inspection Unit of HORIBA PR-PD 2 is capable of handling a wide variety of wafer and mask sizes, shapes, and thicknesses. Its eight-times (8X) object lens provides a wide field of view, allowing for a full range of defect detection and critical measurement. The high speed inspection unit has an adjustable aperture, which is useful for controlling the depth of field and ensuring a high accuracy. The advanced CMOS sensor provides high-speed, high-resolution image capture, allowing for full resolution of defects on the mask or wafer. The advanced sensor is further supported by a full suite of image processing tools, including 3D defect mapping, automatic contrast setting, and noise reduction algorithm. The advanced HORIBA HIAT software integrates with the Dual Light Source High Speed Inspection Unit to deliver robust defect detection and analysis. The software utilizes pattern analysis and machine learning algorithms to detect, identify, and quantify defects for further processing. Additionally, HIAT also offers powerful image filtering tools to enable accurate and efficient defect screening. It also provides a suite of defect process algorithms, including focus distance control and statistical marking. Finally, PR-PD2 combines powerful hardware and software capabilities, delivering accurate and reliable analysis for critical mask and wafer defects. The advanced Dual Light Source High Speed Inspection Unit and CMOS sensor, combined with HORIBA HIAT software provides an effective solution either stand-alone or in-line for mask and wafer inspection and analysis. All these features help to ensure accurate review and perform critical measurements, further optimizing production procedures.