Used ICOS HM-200 #293598500 for sale

ICOS HM-200 is a collaborative Mask and Wafer Inspection Equipment designed to improve the efficiency and precision of semiconductor production. HM-200 is capable of performing two-dimensional (2D) and three-dimensional (3D) automated defect detection, with full defect characterization. The system includes integrated visual, electrical and optical test capabilities, allowing for a high degree of defect coverage. ICOS HM-200 is equipped with a high-resolution imaging optics unit, which enables the machine to detect defects at levels comparable with those of atomic force microscope (AFM). HM-200 has an operating area of up to 600mm x 600mm, and a speed of up to 10um/sec, providing fast and accurate analysis. The image analysis algorithms employed by ICOS HM-200 allow for the automatic detection of both bare defects, as well as layer-dependent defects. The tool is also capable of discriminating risky defects from harmless ones that may be caused by minor misalignments in fabrication processes. HM-200 features easy-to-use software, as well as a user-friendly interface. The asset features a comprehensive defect catalog, a graphical user interface (GUI), a defect library, and recipe and report management. The integrated trace feature allows for precise measurement of the distance between defects, as well as the width and depth of the defect. ICOS HM-200 also includes an optional SINFONIA model, an automatic wafer defect detection and sorting equipment. The SINFONIA system allows for full defect capture and sorting, with the ability to define a custom defect detection recipe and to store information on the defect type. The unit is capable of detecting defects at millimeter level resolution on multi-layer wafers. HM-200 provides a cost-effective solution for semiconductor production, with its advanced image processing and analysis capabilities, as well as its high speed and accuracy. The machine is designed to be a reliable, intuitive, and easy-to-use production tool, providing an efficient and precise approach to Mask and Wafer inspection.