Used ICOS WI-2000 #9239642 for sale

ICOS WI-2000
Manufacturer
ICOS
Model
WI-2000
ID: 9239642
Vintage: 2008
Wafer inspection system 2008 vintage.
ICOS WI-2000 is an integrated mask and wafer inspection equipment that enables high-throughput sample-quality inspection and defect detection. It is capable of inspecting a wide variety of mask and wafer sizes with automated solutions tailored to each user's particular application and process. WI-2000 offers advanced computer-aided inspection technology integrated with comprehensive metrology capabilities. This enables fast, accurate, and repeatable sample measurements, with data import and export, mask alignment, in-depth analysis of defects found, and a streamlined workflow that reduces overhead time and cost. ICOS WI-2000 is equipped with a state-of-the-art camera system integrated with advanced image processing algorithms. It captures high-resolution mask and wafer images, including hi-contrast defects and features of any size. An automated defect-detection unit is integrated for automatic, error-free searches of sample surfaces to select and measure features, while a suite of mask-alignment algorithms ensure proper sample positioning. The machine's optical metrology and inspection capabilities are enhanced with computer-vision tools to automate measurements of features and defects. Sample-position or mask-contour measurements are automated, and sophisticated engineering tools enable pattern recognition and comparison with pre-defined standards. In addition, WI-2000 includes a flexible and powerful software-driven tool that automates complex tasks such as data import and export, image and defect data comparison, histogram analysis, and charting. It also supports 3D data rendering, data analysis, and report generation to help users visualize and interpret complex data quickly and easily. ICOS WI-2000's combination of automated mask and wafer inspection and metrology, together with intuitive user-friendly software, provides accurate, reliable, and repeatable results in a short amount of time. This makes it a powerful tool for precise mask and wafer inspection and defect detection in semiconductor device manufacturing environments.
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