Used ICOS WI-2200 #9183444 for sale

ICOS WI-2200 is a mask and wafer inspection equipment designed to improve the accuracy and speed of quality assurance in the fabrication of semiconductor devices. WI-2200 provides high-resolution imaging and defect detection to quickly identify any contaminants, defects, or other problems that may affect the finished product. The system utilizes specialized technology to perform a wide range of wafer and mask inspections without the need for manual intervention. It supports image acquisition, image processing, and imaging unit connected to monitor and control the inspection process. The machine can operate at both high and low speeds, allowing for quick turnaround in production. ICOS WI-2200 offers two types of inspection: Mask inspections detect potential defects in the lithography masks used in semiconductor fabrication; Wafer inspections identify potential defects in the patterned layers of the wafer itself, such as patterned feature misalignments, litho-etch misalignments, and opto defects. The tool is designed to detect defect concentrations of 0.1 microns and smaller, using a variety of inspection parameters to fine-tune the results. For each inspection, it can collect up to 32 multiple images in contrast, single color, and SXVF (segmented multi-color) modes. It can also measure optical overlaps, resolve line widths, and detect overlay via a special CCD (charge-coupled device) canner. The asset supports a variety of wafer sizes and materials, as well as most optical coordinate systems. WI-2200's features are quickly accessible via its intuitive user interface. A variety of automation tools, such as histogram analysis, automatic defect detection, image capture, wafer map viewer, animation tools, and defect manager, help speed up the inspection operation and ensure consistent results. The model can also be connected to a wide variety of file formats, including TIFF, JPEG, BMP, and FITS, for data transfer and analysis. ICOS WI-2200 is an advanced equipment for detecting potential defects and ensuring the highest levels of production quality. Its efficient and powerful operation minimizes equipment downtime and ensures that the semiconductor device fabrication process is consistent and reliable.