Used IMS 200MH Electra MX #9389231 for sale

ID: 9389231
E-Beam inspection system.
IMS 200MH Electra MX is a top-of-the-line mask and wafer inspection equipment for semiconductor manufacturers. Built with advanced optics and high-resolution imaging capabilities, it can detect defects in semiconductor devices and provide detailed analysis of their exact locations across the entire wafer. The system uses a precise laser scanning unit to capture up to 20 million pixels per second in a scan area of up to 60mm per second. It's also equipped with a variety of imaging modes such as brightfield, darkfield, polarized light, contour analysis, and phase-shift levels that can detect various types of defects, including particles, orientations, scratches, indentations, and bridging. It also features a measurement algorithm that can measure parameters such as line width, line length, and space as small as 16nm. It's integrated with a feature-extraction algorithm that can compare the patterns on the masks and wafers, thus allowing for the precise and repeatable analysis of product features. The machine is designed with both ease of use and speed in mind. It has a graphical user interface that facilitates the operation, configuration, and management of the tool, and provides simulation, analysis, and error reporting features. The asset is also controlled via USB or Ethernet ports, allowing for remote operation and control. The model is designed to operate in three different modes—continuous scan, area scan, and manual scan. In continuous mode, the equipment can scan up to 30 wafers per hour; in area scan mode, it can scan up to 50 wafers per hour; and in manual scan mode, it can scan up to 10 wafers per hour. The system also features low-vacuum functionality, enabling the assessment of particle-free surfaces, and a long-life LED light source that offers consistent lighting over its lifetime. The unit is compliant with VDI/VDE, ESD standard practices, and ISO standards. In addition, it has a powerful data-processing capability, allowing for the rapid analysis of large files and complex images. Overall, 200MH Electra MX is an advanced mask and wafer inspection machine suited for semiconductor manufactures. It has high-resolution imaging capabilities and powerful data-processing capabilities, allowing for fast and precise analysis and evaluation of semiconductor devices.
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