Used IRVINE OPTICAL 3L #9111983 for sale

IRVINE OPTICAL 3L is a mask and wafer inspection equipment that provides non-destructive visualization and metrology of complex micro-electronic components in production process control. Developed by Irvine Optics LLC, it is one of the most advanced wafer and reticle Inspection systems available in the market today. With its software-driven control, high resolution imaging, and auto-indexing platform, 3L is designed to be very user-friendly and efficient. Its high levels of throughput, precise and uniform measurements, and superior image quality make it ideal for wafer metrology. It also has an automated sample handling system as well as a variety of defect detection capabilities. IRVINE OPTICAL 3L unit can inspect and measure a variety of materials including, but not limited to: Aluminum and silica wafers, silicon wafers, and photomasks. It's unique feature set includes an integrated machine vision machine, providing real-time visualization of the sample; a laser scanning tool, with a choice of laser power and wavelength; an image acquisition asset, with background subtraction and 26 simultaneous color channels; an automated sample handling model; and a wide selection of camera field of views, lens types, and laser excitation sources. 3L also has a complete suite of metrology software, integrated in one convenient package. It offers a wide range of imaging and measurement capabilities including: Two-dimensional and three-dimensional image stacking to create 3D images of the sample; statistical analysis for trends in process control; particle identification and counting; dimension analysis; defect identification; particle search and analysis; and complex accuracy analysis. In addition, IRVINE OPTICAL 3L can be tailored to meet the specific inspection needs of the customer. With its many customizability options, such as a variety of workflow engineering, equipment configuration, and data analysis capabilities, the system can be adapted to individual needs, ensuring cost-effective solutions. Overall, 3L offers users the most advanced mask and wafer inspection unit in the market today. Its features combined with user-friendly operation make it the ideal choice for precision inspection and metrology. With its integrated machine vision, automated sample handling, and flexible software customizable features, it is the perfect machine for a wide range of process control and non-destructive metrology applications.