Used IRVINE OPTICAL Ultrastation 3B Model 2 #9157323 for sale
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ID: 9157323
Wafer Size: 6"
Wafer inspection system, 6"
NIKON BD Plan optics
Trinocular head.
IRVINE OPTICAL Ultrastation 3B Model 2, is a state-of-the-art mask & wafer inspection equipment for use in semiconductor fabrication processes. The system offers an efficient tool for working with challenging mask patterns in advanced lithography. It is also designed to work well when analyzing random defect locations, including edge defects. The Ultrastation 3B features motorized xy stage with a maximum travel of 200um × 200mm to provide a high level of accuracy. The stage is tasked with providing video-rate accuracy, smooth motion, and precise positioning. The unit also includes an enhanced auto-alignment software offering a faster tool, which further shortens the downtime associated with tool-setup processes. The Ultrastation 3B utilizes a brightfield illuminator to provide superior visibility for edge inspection on masks and wafers. With its bright illumination, which combines with an optimized telecom camera, the Ultrastation 3B has a capability for detecting low-level defects with high resolution. The machine features an image capture rate of up to 19 frames per second, for superior image acquisition quality. Additionally, the tool's camera incorporates 3D adaptive optics for enhanced imaging effects. The Ultrastation 3B also includes a dual-axis transfer robot for mask & wafer handling. The robot utilizes a transport arm that includes an automated chip-capture unit. The chip-capture unit features a capability to locate its target rapidly and captures the mask or wafer without damaging the edges or the chip itself. IRVINE OPTICAL ULTRASTATION 3.B MODEL 2 is a highly sophisticated and efficient mask & wafer inspection asset. It combines the latest technologies to provide a comprehensive, high-quality machine that leads the industry when it comes to mask & wafer inspection. The Ultrastation 3B is fully customizable, offering comprehensive solutions to a variety of wafer pattern inspection needs. This model is the choice of semiconductor professionals and is certain to remain a top-tier, cost-effective, reliable choice in wafer pattern inspection systems for years to come.
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