Used IRVINE OPTICAL Ultrastation 3E #9157328 for sale

IRVINE OPTICAL Ultrastation 3E is an advanced multi-application mask and wafer inspection equipment designed to help users achieve the highest levels of process control and defect detection. The system utilizes the latest in optics and electronics to provide a unique combination of high resolution, speed, and flexibility. It is designed to meet the full range of inspection requirements for semiconductor masks, wafers and substrates. Ultrastation 3E features an advanced imaging technology with high-speed optical capture to maximize throughput and accuracy. The unit also includes a proprietary Viewer software package that allows for enhanced image display and processing. This software provides high-magnification optics with correction for polar-axis tilt, along with automatic contrast and brightness enhancement. Additionally, a freely rotatable polarized light illumination machine offers high-precision alignment with flexible viewing angles. For optimal inspection and data analysis, IRVINE OPTICAL Ultrastation 3E uses a high-resolution digital light source and advanced inspection techniques. These scanning and imaging functions enable users to examine features down to 0.25µm with improved sensitivity. The improved sensitivity allows users to detect defects as small as 1-2µm across the entire surface of a mask or wafer. The 3E Ultrastation tool comes ready to use with many preference settings that provide accuracy and repeatability to meet specific user needs. Users can rely on the asset to ensure they have the highest levels of accuracy, reliability and repeatability for their mask and wafer inspections. Outputted data is saved in ASCII or raw format to allow for further inspection and analysis if desired. The 3E Ultrastation can be used as a stand-alone model for inspections, or it can be integrated into a larger inspection equipment for higher process throughput. Ultrastation 3E is an advanced mask and wafer inspection tool that can help users achieve the highest levels of process control and defect detection. With its high-resolution digital light source, advanced imaging and data algorithms, and flexible viewing angles, users can now have improved accuracy and repeatability with their mask and wafer inspections. IRVINE OPTICAL Ultrastation 3E system is designed to provide users with a reliable and efficient tool to deliver the highest level of defect detection.