Used IRVINE OPTICAL Ultrastation #293792555 for sale

ID: 293792555
Wafer inspection system.
IRVINE OPTICAL Ultrastation is an advanced mask and wafer inspection equipment that is designed to provide superior results in terms of low defect density, accuracy, repeatability and throughput. This system is ideally suited for automated optical inspection and metrology needs in wafer and reticle inspection, surface and interface analysis, as well as microelectronic process evaluation. Ultrastation features an advanced optical design to deliver superior imaging and bright field illumination. The unit is equipped with a high accuracy mechanical and optical stage with the capability to move accurately in X, Y and Z directions. This advanced technology enables it to provide a highly accurate and repeatable profile for each measurement. The machine also includes a high resolution camera for capturing images of all types of masks and wafers, as well as an IR sensitive inspection camera for surface, strain and film thickness measurements. To ensure maximum accuracy, IRVINE OPTICAL Ultrastation utilizes a high-precision alignment tool. This asset helps align the inspection equipment and ensure proper focus throughout the entire analysis process. Additionally, Ultrastation is designed with a QuadLight albedo contouring tool to measure the photolithography structures, accurately identify potential errors, and quickly resolve any irregularities. IRVINE OPTICAL Ultrastation also utilizes advanced software to make sure each analysis meets the highest quality standards. The STORM software suite runs on a Windows platform and provides users with an easy-to-use interface for measuring, imaging and analyzing sample images. Analysis functions include automated table detection, grid definition, element area definition, edge detection, island analysis, crosshatch analysis, phase separation analysis and layer shift analysis. In addition to this, Ultrastation is equipped with a unique Spatial Phase Analysis technique that helps avoid the need for expensive multiple stages and permits real-time identification of features such as lithography fields, lines, circles and other features. In short, IRVINE OPTICAL Ultrastation is a versatile model that provides users with a comprehensive set of features to optimize the inspection and analysis of wafers and masks.
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