Used J-MAR 010-3180-012 #9236123 for sale

J-MAR 010-3180-012 Mask & Wafer Inspection Equipment is an optimized imaging solution for semiconductor applications. This system provides reliable and accurate defect observation and metrology over all types of substrates and materials. The unit is designed for inspection of masks, wafers, and dielectric layers, as well as a range of optical images, such as optical absorption, reflectivity, transmittance, and diffraction. It consists of three components: an optical microscope, spectral filter, and digital camera. The optical microscope works with an NA 1.4 rod lens that provides a high-resolution image of the substrate or material at a different image scale and focus. It is also equipped with a long-range illumination machine for increased availability of the image. An advanced FFT (fast Fourier transform) approach is incorporated for improved contrast, low distortion, and excellent imaging resolution. The spectral filter is used to remove unwanted frequencies from the transmitted light, enabling the detection of sharp features with enhanced detectivity. The filter also offers a wide spectral range from visible ultraviolet (UV) to near infrared (NIR), resolving both large and small sub-micron images. The digital camera provides a detailed, high-resolution image. It is configured with an intensified CCD chip for increased sensitivity and dynamic range, allowing for better detection of smaller defects. The camera can be used to capture single images or long series of images, allowing the user to monitor and identify precise defect structures over an extended period of time. In addition, the tool is equipped with advanced image processing tools, such as defect recognition algorithms, defect characterization, and defect analysis. The results can then be further analyzed to determine the root cause of the defects. J-MAR 010-3180-012Mask & Wafer Inspection Asset provides a high performance, low cost solution with its combination of advanced imaging capabilities and reimaging processing tools. This model allows for defect detection and characterization for both processing and quality control applications. With the ability to provide accurate, reliable results, 010-3180-012 Mask & Wafer Inspection Equipment is a reliable solution for masks and wafers defect inspection.