Used J-MAR S2610-01-01 #9211242 for sale

J-MAR S2610-01-01 is a high-precision mask and wafer inspection equipment used in the semiconductor industry. This system utilizes advanced optics, lasers, and automated software-based inspection techniques to accurately measure and accurately detect defects in a wide range of advanced materials such as silicon wafers, mask, and interconnects. The unit is equipped with a variety of sensors, including a microscopic CCD camera with 1024x1024 resolution. This high-resolution camera allows the operator to detect even the smallest surface defects down to the nanometer scale. In addition, a parallel confocal laser machine with 0.05 micron spot size is included for highly precise measurements. The tool also features a proprietary optics technique known as Laser Beam Stripping (LBS), which can detect even the thinnest layers of material as thin as 0.1 microns. The asset is powered by a bespoke software package called the WIP Control Model (WIPCS). This software provides the user with powerful and accurate defect detection capabilities, including pattern matching, 3D shape analysis, and best-fit analysis. This ensures that even the most sophisticated processes, such as electro-photography (E-beam) and advanced lithography, can be accurately and effectively monitored. In combination with its advanced optics and sensing technology, S2610-01-01 equipment is also fitted with advanced automated process control features. These features ensure that all processes are operated reliably and efficiently. The controlled automation and integration of these features allows for reduced operational costs and improved process yields. Finally, this system comes with an accompanying suite of data analysis software for the detailed evaluation of defect monitoring, feature measurements, and other critical process variables. This analysis ensures the highest quality product output with maximum efficiency. In summary, J-MAR S2610-01-01 is a hi-tech mask and wafer inspection unit which uses combining advanced optics, lasers, and automated software-based inspection techniques to detect and accurately measure defects down to the nanometer scale. It is also fitted with process control features and data analysis software for optimal product output. This machine is ideal for advanced processes such as E-beam and advanced lithography.