Used K-MAC SpectraThick #293756646 for sale

K-MAC SpectraThick is a mask and wafer inspection equipment designed for inspecting large-area, ultra-thin wafers and masks. The system offers the highest accuracy and resolution on the market, along with the fastest inspection speed. The unit is equipped with 10nm resolution and high-precision metrology, enabling it to accurately and quickly inspect masks and wafers up to a diameter of 600mm. SpectraThick machine features an integrated telescope that enables fast exposure time and a large field of view. It also includes a variable magnification objective that uses F-theory designed optics to provide excellent performance when inspecting large-area features. Additionally, the tool utilizes a two-view, multi-channel image analysis asset to provide a comprehensive view of sub-wavelength defects on the sample. To ensure the highest accuracy, the model utilizes a dual-beam scanning architecture consisting of a laser beam and a slit beam. The slit beam is used to scan the sample with a fixed dwell time and laser beam is used to scan the sample in a line direction, enabling fast cover-to-cover imaging. The equipment also includes an automated dust recognition system that can detect and eliminate dust particles from the sample before scanning begins. The unit can be easily controlled using the interactive user interface, which allows operators to quickly adjust settings for brightness, contrast, and focus. Additionally, K-MAC SpectraThick machine incorporates an advanced image processing module that provides users with options for edge detection, contrast enhancement, defect measure, and defect map detection. The tool produces high-quality images and accurate inspection results with a high dynamic range and low noise ratio, allowing for precise measurements and analysis. Additionally, the asset has a high throughput rate, which enables it to quickly perform large-scale inspections. Overall, SpectraThick model is an advanced mask and wafer inspection equipment that offers excellent performance and accuracy for a range of samples. The system's features enable it to quickly and accurately inspect large-area, ultra-thin wafers and masks, making it a great choice for operations requiring enhanced levels of detail and accuracy.