Used KARL SUSS / MICROTEC BA300-MIT #9158291 for sale

KARL SUSS / MICROTEC BA300-MIT is a mask and wafer inspection equipment designed to deliver high-resolution imaging and automatic defect detection for photomasks and, in front-end wafer processing. It is designed to provide defect coverage up to 25 μm, and it can be used as a standalone tool as well as in conjunction with other microlithography tools. MICROTEC BA300-MIT features a high-precision automated wafer transport system, which ensures uniform and reliable operation of the unit. The machine also features optics that can be fine-tuned to achieve high resolutions and contrast. The machine is optimized for use with small field of view imaging to reduce background noise, and it uses a double telecentric tool to capture images. This ensures accurate and consistent results. In addition to its imaging capabilities, KARL SUSS BA300-MIT also features an integrated microchip camera. This camera is designed to capture defects and allows for the efficient use of inspection data. It is equipped with a wide dynamic range to accurately detect and measure surface and subsurface defects with a high accuracy. The camera is also designed to minimize background noise and other distortion during the inspection process. The mask & wafer inspection asset also includes automated make-rung inspection, which is used to detect and isolate critical defects. This process helps improve product yield by eliminating false positives and reducing the cost of defect repair. The model also includes a defect analysis algorithm to isolate and identify individual defects in the scanned sample. In addition to automated defect detection and inspection, BA300-MIT also features an OCR equipment for text recognition. This system can be used to quickly read and interpret patterns and symbols on mask and wafer samples. These patterns and symbols can be used to precisely classify defects and to improve the unit's overall accuracy. KARL SUSS / MICROTEC BA300-MIT is an advanced mask and wafer inspection machine that is designed to deliver reliable and accurate results. Its high resolution imaging and automated defect detection capabilities make it an ideal tool for front-end wafer processing. With its integrated microchip camera and high dynamic range, the tool can identify critical defects quickly and accurately. The asset's automated inspection technology and OCR model also help to reduce costs associated with false positive detection and defect repairs.