Used KLA / ICOS CI 8250 #9156475 for sale

KLA / ICOS CI 8250 is a mask and wafer inspection equipment developed for high-volume semiconductor production. The system features a non-contact optical imaging technology, with a wide range of magnifications from 5x up to 800x. This allows the unit to detect defects down to 25 nanometers in size. The machine also has a patented Dual-Light Laser Illumination (DLI) capability which enables the detection of contextual defects, including patterns or fails. The tool also includes a multitude of software capabilities. It has software that can automatically identify features on the mask or wafer, identify typical defects, and then reject or accept wafers accordingly. This asset can accurately detect a range of patterns and features, including those that are in-line, isolated, or in a random distribution. It also has capabilities for multi-view defect review and defect counting. Further features of KLA CI 8250 include a fully-automatically wafer alignment model, as well as automatic focus, exposure, and mask tilt capabilities. This ensures that features can be effectively aligned and the imaging equipment maintains perfect focus on the wafer or mask while inspecting it. The software that is included with ICOS CI-8250 includes an on-line imaging analysis (OIA) system which allows for real-time defect detection and analysis, and it also has a direct defect recognition (DDR) unit for fast and accurate automated defect classification. CI-8250 is a high-performance inspection machine designed for the most demanding semiconductor production environments. It is capable of detecting small defects quickly and accurately, and can be used both in the production line as well as the research lab. Its wide range of magnifications, DLI capabilities, and software features make it one of the most advanced wafer and mask inspection systems available.