Used KLA / ICOS CI 8250 #9208706 for sale

KLA / ICOS CI 8250 is a highly advanced microlithography mask and wafer inspection equipment. It was designed to support the latest mask inspection and wafer-level defect detection requirements demanded by the escalating process complexities of latest-generation semiconductors. It gives customers the right tools to accurately inspect and review mask defects and other related areas. KLA CI 8250 provides the highest level of image quality and defect detection process for mask and wafer inspection. The system features an advanced light source with two high-resolution digital cameras to display features on a die-level. It also has a scanning resolution of 5 microns, three LED light engines providing uniform in-field illumination, and a measurement range of 20mm to 305mm. Furthermore, its 8 inch flat panel x-y stage is designed for easy loading and unloading of samples, which helps minimize exposure to any particulates. The 8250 also features an automated survey and alignment unit to examine samples in both the x and y directions, and can detect and/or classify defects to provide consistent, rapid and repeatable inspections. The machine is designed with a cleanroom-friendly enclosure designed to reduce any irradiation caused by operator ingress, and offers a range of optional Environmental Control Units (ECUs) to maintain consistent humidity and temperature conditions to ensure a high-quality inspection at every step of the process for maximum accuracy. In addition, ICOS CI-8250 has automated on-board quality-controls that enable users to quickly set up and execute inspections. With an intuitive operation tool, users can measure, report, log, and compare results, thus making it easy to analyze and understand the defect pattern. Using powerful algorithms, the asset can locate and characterize defects faster and more accurately than traditional methods. The 8250 is a revolutionary KLA product which combines maximum flexibility and precision for mask analysis, wafer inspection, and defect characterization. It offers the ultimate in accuracy and productivity in a high-quality, low-cost solution for the inspection of wafer-level defects.