Used KLA / ICOS CI 9450 #146762 for sale

KLA / ICOS CI 9450 is a world-class mask and wafer inspection equipment that utilizes advanced imaging technology and powerful software tools to detect defects on semiconductor resists and wafers. KLA CI 9450 can operate in both manual and automated modes, providing superior accuracy and reliability. The system is equipped with a high accuracy spinning stage and backlight imaging, allowing for inspection of specimens up to 150mm in diameter. ICOS CI-9450 utilizes patented multi-spectral imaging capabilities with 161 line-scan sensors which gather, analyze and interpret critical mask and wafer features with great precision. It features advanced image stabilization and also includes a solid-state air-bearing stage, which scans chips at high speed, allowing for a low overall cost-of-ownership. The unit's advanced user-friendly controls make navigating through machine functions and viewing results a simple, intuitive process. The core component of the tool is KLA Opto-Flow technology - an imaging processor that renders mask and wafer measurements in real-time with greater accuracy than other machines. It has a feature-rich Mask Design File Editor, which provides an intuitive graphical user interface for designing feature patterns and allows for easy editing and optimization of masks. ICOS CI 9450 is powered by a software package called ICOS PME (Pattern Measurement Engine); this robust software enables the asset to process and analyze data acquired from mask and wafer samples quickly and accurately. It provides a comprehensive suite of yield diagnostic and process control tools, along with tools to improve material reactivity and defect detection. Inspection results are delivered in graphical and numerical format on CI-9450's 21" TFT touch-screen and can be easily transferred to any compatible computer. This helps to facilitate comparison of data and provides precise analysis of results. A built-in viewer helps users quickly analyze large sets of images and data. CI 9450 is the perfect solution for a wide range of mask and wafer inspections, offering an easy-to-use, comprehensive model that increases process yields, productivity and reliability.