Used KLA / ICOS CI 9450 #9156476 for sale

KLA / ICOS CI 9450 is a mask and wafer inspection equipment specifically designed for high-precision imaging and analysis of photomasks and wafers that are used for semiconductor lithography. The system uses advanced optical techniques as part of its imaging and analysis strategy, including laser illumination, advanced optics, and computer-controlled stage mechanisms. The unit features a 4-megapixel camera with high-resolution imaging capability, allowing for precise observation of fine line features on photomasks and wafers. It employs a six-quadrant ring-illumination machine to provide precise, uniform illumination over the entire field of view. The light source and collimator allow for easy selection and control of diffused illumination and laser illumination angles and intensities. The 91-megapixel detector array provides high resolution imaging in both bright and darkfield mode. This allows for accurate measurement of critical electrical feature sizes. A high-resolution monochrome ccd camera is also used to inspect address patterns on the wafer. The detector array also allows images of patterns to be captured in various illumination angles and scales. The tool also incorporates a number of advanced algorithms to provide detailed analysis of mask or wafer images. This includes optical character recognition, low contrast enhancement, low exposure examination, and image sharpening. The asset also features a number of automated processes for analyzing images. These include automatic wafer classification, automatic defect identification, automatic failing chip detection, and automatic focus scanning. The model can also generate defect inspection reports. In addition to imaging and analysis, the equipment can be used for pre-production mask verification and process control. It also allows for wafer-to-mask comparison to maximize efficiency and accuracy. In conclusion, KLA CI 9450 system is a highly sophisticated and precise instrument designed for mask and wafer inspection. It utilizes advanced optical techniques and algorithms to provide high-resolution imaging and detailed analysis of semiconductor lithography patterns. In addition, it incorporates a variety of automated processes for high-speed and accurate data analysis.