Used KLA / ICOS CI 9450 #9159878 for sale

KLA / ICOS CI 9450 is a mask and wafer inspection equipment designed to offer outstanding performance and accuracy for semiconductor and mask inspection operations. It is based on KLA proven ICOS™ technology, providing an automated, robust solution for defect inspection and iterative process control. At the heart of the system is a 5-axis, high accuracy wafer stage that supports automated, accurate imaging of large area masks and wafers. Coupled with powerful image processing capabilities, KLA CI 9450 yields detailed optical inspection, allowing it to provide defect inspection and process control. ICOS CI-9450 uses two-dimensional critical dimension (2D CD) metrology to measure and monitor the smallest features on a mask or wafer. It is equipped with an array of five-axis precision robotic stage and a light source used to accurately image the surface. The light source transmits a controlled image onto the object, which is then detected by the CCD cameras. This information is then processed by the image processing unit and compared to the standards. Any anomalies or discrepancies between the standards and the measurements are noted and reported. The precision of ICOS CI 9450's imaging and metrology is further enhanced by a non-contact, 3D imaging machine that uses an autofocus module and laser, enabling it to accurately measure the 3D geometry of masks and wafers with high accuracy. The modular design of the tool makes it flexible and upgradeable, so it can be tailored for different applications. KLA CI-9450 is capable of defect analysis and iteration process control, ensuring defect-free production. It can detect even the most difficult defects through automated, high-resolution imaging, spot defecting, and directional illumination. It also has an algorithm library and statistical trending tools, which provide process control and design verification data. CI 9450 is a powerful, reliable asset for semiconductor and mask inspection. It offers automated, accurate imaging and defect analysis, with advanced metrology and defect detection tools. The model is built with robust components and software, capable of delivering precise visual inspection results. CI-9450 is an ideal choice for achieving maximum performance in mask and wafer production.