Used KLA / ICOS CI 9450 #9159881 for sale

ID: 9159881
Vintage: 2003
Lead inspection system Camera: Yes HDD: No 2003 vintage.
KLA / ICOS CI 9450 mask and wafer inspection equipment is a versatile and accurate system for inspecting the quality of masks and wafers used in the fabrication of semiconductor devices. It is a high-throughput wafer inspection unit optimized to image small features and defects on semiconductor wafers. It is designed for inspecting only clean wafers and is not suitable for inspecting wet wafers. The machine is capable of detecting small features or defects with resolutions greater than 1 micron in diameter. KLA CI 9450 comprises of a multi-function imaging tool which includes a high-resolution digital camera and advanced optics. The illumination asset consists of a high-power LED lighting array and a beam splitter for optical imaging while the scanning stages are capable of moving the mask or wafer in the x, y, and z-axis. The imaging is achieved via a multi-stage vision process where a low-resolution image is taken at high speed to establish overall status. If defects are detected, however, more detailed imaging is possible. This is achieved by moving to different points on the wafer and targeting the defects individually. ICOS CI-9450 can inspect defects such as die flaws, dark or light particulates, arcs, bubbles, and pinholes. The mask and wafer inspection model also has capability to record the location of the defect as part of the defect map as well as providing an automatic wafer classification such as Good, Average, or BG. The hardware and software versatility of the equipment makes it suitable for various applications including wafer-level, cell-level, and device-level inspections on a wide range of wafer types including LCDs, lithography masks and wafers, RF boards, Assembly & Packaged ICs, and CMOS. The advanced optics and illumination systems ensure that the image quality is adequate to enable reliable inspections. KLA / ICOS CI-9450 is able to operate in an automated mode as well as manual scanning mode where the operator can select the scanning area and select how many die to be inspected. The built-in defect analysis capability of the system helps with automatic defect detection as well as the recording of defective information which can be studied for further insight. The unit is equipped with an advanced administrator and data management software for setting up and operating the mask and wafer inspection machine. This software makes it easier to generate reports about the inspection process and it can also interpret the data so that appropriate corrective measures can be taken when defects are identified. Overall, CI-9450 mask and wafer inspection tool is a robust, reliable, and easy to use asset for inspecting the quality of masks and wafers. It is highly efficient and has the capability to detect small defects which other inspection systems may not be able to detect.
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