Used KLA / ICOS CI 9450 #9173937 for sale

KLA / ICOS CI 9450 is a mask and wafer inspection equipment designed to deliver high throughput yield performance. It is the successor to KLA CX 9350, incorporating advanced automation and customizable hardware and software capabilities. The system utilizes the concurrent use of brightfield, darkfield, and UV imaging, as well as patented enhanced overlay techniques to ensure precise defect detection and classification. The unit features a 25 megapixel brightfield digital camera and an 8 megapixel low light level digital camera, each with a two-inchtelecentric lens machine. The large field of view and high resolution provide superior performance over a wide range of wafer sizes and types. Additionally, the tool is also equipped with a UV binary phase contrast imaging capability for improved imaging of transparent materials. The state-of-the-art CCDs featured in KLA CI 9450 deliver superior optical sensitivity, featuring enhanced artifacts such as 3D photoresist stepping. In addition, the asset's patented enhanced overlay technique is incorporated to detect and categorize potential overlay-related defects. In terms of inspection speeds, the model has a maximum acceleration of 6G, enabling >640 inspections of wafers per hour. The equipment also supports parallelism feature, which permits multiple patterns or targets to be aligned in parallel from continuous wafers. Furthermore, ICOS CI-9450 includes advanced automation capabilities, such as automatic module ejection and multiple pattern load/unload capabilities, in order to maximize throughput. CI-9450 provides users with improved and automated workflow control using a variety of user-friendly measures. This includes the capability to manage up to 10 integrated objectives per goal, combined reporting with detailed views of data, and easy shift-to-shift job set-up tools. Overall, KLA / ICOS CI-9450 is an advanced, highly precise mask and wafer inspection system that features an advanced automated workflow control, high speed inspection capabilities, and superior imaging resolution. It is perfect for those looking for improved yield performance and a faster throughput in the semiconductor industry.