Used KLA / ICOS CI 9450 #9186346 for sale

KLA / ICOS CI 9450 is a market-leading mask and wafer inspection equipment that provides industry standard defect inspection and electrical test results. This fully automated system is designed to inspect photomasks and wafers with superior accuracy and repeatability. The unit covers all varieties of masks and wafers, including high aspect ratio, large and irregularly shaped, and other hard-to-inspect devices. It utilizes four distinct but synchronized detection systems: an imaging machine, an electrical tool, a pattern recognition asset, and an inspection model, to accurately image all mask and wafer features. The imaging equipment consists of a 4K microphone and a high-resolution camera to capture the surface defects and mask patterns. It is coupled with 2D lenses with autofocus technology to maximize image quality. Using real-time depth sensing technology and advanced image processing, the system can capture a wide range of surface details including: die-to-die spacing, line widths, contact openings, protrusion and edge constraints, and more. The electrical unit also integrates the 4K microphone, using sound to detect electrical shorts and opens, as well as minor current flow variations. It is designed with shielded chamber construction with an adjustable pneumatic height control machine to ensure consistent electrical performance. The pattern recognition tool features a high-powered multi-core processor and advanced pattern recognition algorithms. This asset is designed to recognize defects in mask patterns and inspect them for flawlessness. The inspection model features a sophisticated optical inspection head with 4K field of view and state-of-the-art defect categorization algorithms. This equipment offers quick and reliable inspection of 1µm or larger defects, as well as virtually any complex design pattern. Overall, KLA CI 9450 is an advanced detector system with an array of advanced technologies that efficiently inspect complex masks and wafers and ensure that they are error-free. Its robust and reliable design help to prevent product losses and maximize cost savings. With the capability to detect every surface feature with great accuracy, it is the ideal tool for any photomask and wafer inspection needs.