Used KLA / ICOS CI 9450 #9230345 for sale
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ID: 9230345
Vintage: 2005
Inspection systems
For QFP, QFN and BGA application
(2) TNR
(2) Tray to tray
Tray to tape
2005 vintage.
KLA / ICOS CI 9450 Mask & Wafer Inspection Equipment is a semi-automated microscope designed for detailed visual examination of masks and wafers across a wide range of critical dimensions. It is especially useful for inspecting contact and through-hole defined structures on active device layers of semiconductor wafers, thin films, and MEMS devices. The system is equipped with data-enriched digital high-resolution optics, a light source ranging from UV to infrared, and a range of filter capabilities. It has the ability to accurately reveal defects and features down to one micron in size. The integrated bright field, dark field, and RGB color modes provide enhanced contrast to aid in the detection of subtle patters and patterns. A large working area of 50mm allows users to work with larger samples, while the integrated stagedrive compensates for sample distortion. KLA CI 9450 also offers custom automated measurement capabilities for regions of interest, which can save users time compared to manual measurement techniques. It is also equipped with high speed data transfer capabilities for quick download of data from host PCs and network connections. This helps to automate image capture and subsequent image processing and analysis. ICOS CI-9450 incorporates an optically-isolated physical frame to prevent noise interference and reduce unit maintenance. It also includes an ASIC to help reduce machine integration time along with the integrated step-and-repeat scan mode. This helps to make the tool capable of continuous quality control of high volume production. Overall, KLA CI-9450 Mask & Wafer Inspection Asset is an advanced yet accessible tool for semiconductor, thin film, and MEMS quality control and imaging. Its design and features integrate a range of tools to help users quickly identify potential defects in samples, as well as accurately measure the size and location of features with custom automated measurements. Its performance and data transfer capabilities ensure high quality, high throughput, and factual results.
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