Used KLA / ICOS CI 9450 #9244496 for sale

KLA / ICOS CI 9450 Mask & Wafer Inspection Equipment is a high performance Optical Surface CCD Mask and Wafer Inspection System designed to perform defect inspection of both advanced photomask and wafer surface. The unit ensures maximum achieveable inspection resolution and productivity. The machine is based on an advanced optical imaging tool which consists of two high resolution monochrome CCD cameras, one with straight line magnification and another with diascopic imaging. The two cameras provide an optimum wide field of view and are equipped with programmable inspection fields, on-axis and off-axis illumination and advanced imaging techniques such as phase shifting, identification, and color tuning. The cameras are linked to an image processor/viewing station which allows for image manipulation. The processor is outfitted with a variety of software programs which allow the user to locate, identify, and evaluate defects. It also allows the user to inspect various regions of the mask or wafer and to acquire the images of interest. In addition, the software can calculate the density of defects and store it in an on-board database for future analysis. The asset is designed to operate at high efficiency and can attain inspection speeds of up to 100 wafers per hour with an accuracy of up to 0.1µm. It is equipped with a secure Ethernet for remote access so that the user can control it from anywhere in the world. The model comes with a variety of user-friendly features such as an intuitive user interface, full integration with FOUP's and LOT's, quick job submission and retrieval, error logging, and real time fault isolation. Furthermore, the equipment is fully compatible with the latest lithography and metrology systems and compatible with a variety of photomask and wafer formats. It is compliant with industry standards and offers optional built in image classification, inspection report generation and drill down analysis. Overall, KLA CI 9450 Mask & Wafer Inspection System is a complete and comprehensive unit which provides the user with high resolution imaging capabilities as well as advanced software programs to enable cutting edge defect inspection of photomask and wafer surfaces.