Used KLA / ICOS CI 9450 #9253653 for sale

KLA / ICOS CI 9450 mask and wafer inspection equipment is a comprehensive and comprehensive mask and wafer image system designed to identify and assess defects in semiconductor IC lithography and IC packaging applications. The unit combines the latest in optical and vision algorithms, state-of-the-art sensors and high-end vision processing hardware to provide superior defect detection and classification performance. KLA CI 9450 mask and wafer inspection machine is equipped with a high resolution camera with a wide range of measuring capabilities. With a wide field of view of up to 100 microns, the tool is capable of detecting and measuring wafer defects on all types and sizes of wafers. The camera is also equipped with an automated zoom feature, enabling precise and repeatable defect detection. ICOS CI-9450 mask and wafer inspection asset utilizes patented, state-of-the-art algorithms for defect characterization and classification. These algorithms are capable of identifying defects with a high degree of accuracy and reliability. The model is also equipped with an advanced classification equipment that is capable of distinguishing between different types of defects and categorizing them according to size, type and other characteristics. CI 9450 mask and wafer inspection system is designed for high-speed operation and offers flexible operator controls, allowing the user to customize operations to suit their production requirements. The unit is also highly scalable, allowing users to expand their machine's capabilities as their production requirements grow. CI-9450 mask and wafer inspection tool is designed with a wide range of fault detection and analysis capabilities, enabling rapid and precise identification of faults. Through its fault analysis capabilities, the asset can accurately characterize the type, location and severity of fault and provide detailed reports for further analysis. KLA CI-9450 mask and wafer inspection model is a reliable and versatile tool that provides high performance defect identification and characterization to help ensure successful lithography and IC packaging applications. With its advanced, patented algorithms and cost-effectiveness, it is an essential component of any IC production setup.