Used KLA / ICOS CI 9450 #9263041 for sale

KLA / ICOS CI 9450 is a well-known mask and wafer inspection equipment designed for semiconductor fabrication and research purposes. It ensures comprehensive and reliable quality control in the process of inspecting integrated circuits. The system boasts several first class features that make it ideal for meeting the needs of both chipmakers and researchers. Some of these qualities include high accuracy, high speed, enhanced sensitivity, and cost-effectiveness. Firstly, this unit is designed with an excellent accuracy rating. It is capable of measuring and identifying incredibly small defects on silicon wafers and masks with an accuracy of up to 2µm. Its impressive resolution is designed to effectively detect defects of any shape and size on these structured surfaces. KLA CI 9450 can also complete inspections at incredibly high speed. This is necessary for semiconductor fabrication and research facilities who require fast turnaround. In addition to this, ICOS CI-9450 offers enhanced sensitivity, meaning it can identify and measure defects with relative ease. This machine can detect subtle differences in the surface topography of wafers and masks, allowing for enhanced traceability and quality control. Moreover, KLA / ICOS CI-9450 is designed as an economically viable solution. It offers an optimized return on investment, making it a popular choice for many businesses. This tool is easy to install, use and maintain, allowing for consistent and long-term operation. Additionally, it boasts several safety features such as an optional air/water sensor and Windows 7 certification, both of which help to safeguard the users from any potential hazard. In conclusion, CI-9450 is an effective and reliable mask and wafer inspection asset. It provides high accuracy, speed, sensitivity, and cost-effectiveness. This model is a go-to solution for businesses in semiconductor fabrication and research who require quality control, as it is designed to accurately measure and identify even the smallest of defects on its structured surfaces.