Used KLA / ICOS CI 9450 #9363159 for sale

KLA / ICOS CI 9450 Mask & Wafer Inspection Equipment is designed to meet the stringent quality requirements of state-of-the-art patterned-media inspection. It offers high-resolution production-grade imaging, automated real-time system repair, and extensive inspection capabilities to provide maximum pattern fidelity, defect detection, and yield assurance. The unit is equipped with a high-resolution 6-megapixel full-frame camera, allowing for resolution greater than 1µm and measurement accuracy better than 1µm. It is also capable of capturing image data in both linear and multi-view modes. A field-replaceable dynamic cold-field emission source provides the optimum illumination for detecting defects, while the machine's adaptive lighting technology ensures contrast-optimized results. The tool's advanced defect detection capabilities include automated classification and sorting of defects, assisted-classification of defects, false-positive mitigation, and process control. It can review a wide range of defects, from defects larger than 0.8µm to ultra-tiny defects less than 500nm. KLA CI 9450 is also equipped with a high-efficiency global-coordinated-alignment tool and automated asset repair capabilities to reduce potentially wasted inspection time and improve yield. The model includes a comprehensive dashboard UI to view, analyze, and manage inspection results. Full traceability of all inspections is also provided, allowing quick assessment of lithography process changes and verification of inspection conditions and results. Additionally, the equipment is integrated with a powerful reporting interface to enable more efficient design-for-manufacturability analysis. ICOS CI-9450 provides high-speed remote access, and the system's Calibrated Measurements Option validates defect measurement accuracy and reliability. The unit also offers a wide variety of software features, including auto-focus, wafer-flat auto-detection, and level-memory functions. The CORE Machine software platform provides an in-depth and intuitive user experience, making the tool an ideal choice for patterned-media inspection.