Used KLA / ICOS CI 9450 #9396597 for sale

KLA / ICOS CI 9450 is an advanced, automated mask and wafer inspection equipment designed for semiconductor fabrication. It offers capabilities such as high-speed image acquisition, automated defect review, and mask metrology. The system utilizes leading-edge optics technology to enable precise measurements and high-resolution images of lithographic patterns, providing a reliable way to detect defects and non-conformities on wafer masks and finished wafers. The unit consists of two components - the Wafer Inspection Unit (WIF) and KLA Correlative Image Acquisition and Review Machine (CIARS). The WIF is responsible for acquiring and processing high-resolution images of the mask or wafer being inspected. The WIF can acquire images at speeds up to 60 seconds per wafer, allowing for rapid and efficient inspections. It is equipped with a variety of lenses, allowing it to capture different field of views. A variety of image formats are supported, allowing for easy comparison between images. The CIARS component handles the reviewed of the mask or wafer, using a proprietary defect detection algorithm to highlight defects and non-conformities. The tool uses sub-pixel edge detection combined with rule-based pattern recognition to detect and classify defects. The CIARS asset can be configured for a wide range of scopes and applications, allowing for flexibility in configurations. Additionally, it supports multiple languages for a wider user base. KLA CI 9450 offers a wide range of features and benefits. It provides high-resolution imaging capabilities with fast image acquisition speeds. It also has automated defect review and mask metrology capabilities, allowing for efficient and precise defect spotting. Additionally, it offers a wide range of customizable configurations, making it suitable for a wide range of applications and users. The model is designed to be easy to use and maintain, ensuring reliable performance and minimized downtime.